Permanent Negative Epoxy Photore​sists​

▷ Material Attributes​

· Spin coat films from <1µm to >100µm

· High thermal and chemical resistance

· Optically transparent

· Compatible with i-Line imaging equipment

▷ Material Uses​

​· Fabrication of PDMS molds

· Structural components such as micro arrays, fluidic channels, display pixel walls and dielectric layers

· Dry etch masks

· Rapid prototyping

※ Compatible Developer: SU-8 Developer​