Non-polar thermoplastic NIL Resist​

▷​ Material Attributes

· Film thickness of up to 5 µm possible for the fabrication of microfluidic or lab-on-chip devices

· 100% organic thermoplast → dry etching and stripping possible with pure oxygen plasma

· featuring the highest optical transparency in the range of UV/vis

 and distinctive chemical stability against e.g. different solvents, acids, and bases

▷ Material Uses

· ​Bio applications

· Microfluidics

· Microoptical elements

· Wave guides

· Single and multilayer systems

· Mask for pattern transfer processes