Photo-curable thermoplastic NIL resist​

▷​ Material Attributes

· Excellent thermal structure stability in subsequent processes due to the photochemically induced crosslinking reaction during imprinting

· 100% organic NIL resist → dry etching and stripping possible with pure oxygen plasma

▷ Material Uses​

​· Fabrication of nanopatterns by pattern transfer for e.g.

· High brightness LEDs

· Photonic crystals

· Patterned media

· Nano-optical devices, subwavelength optical elements