Thermally curable NIL resist​

▷​ Material Attributes

· Excellent thermal structure stability (up to 250 °C in a two-step imprinting process)

  in subsequent processes due to the thermally induced crosslinking reaction during imprinting

· 100% organic resist → dry etching and stripping possible with pure oxygen plasma

▷ Material Uses

​Fabrication of nanopatterns by pattern transfer for e.g High brightness LEDs

                                                              Photonic crystals

                                                              Patterned media

                                                              Nano-optical devices, subwavelength optical elements