Permanent Negative Epoxy Photore​sists​

▷ Material Attributes​​

· Highaspect ratio imaging with near vertical side walls

· Near UV (350-400nm) processing
· Film thicknesses from 1 to >200μm with single spin coat processes 

· Superb chemical and temperature resistance

▷ Material Uses​

· MEMS devices

· PDMS molding

· Inkjet nozzles

· Microfluidics

※ Compatible Developer: SU-8 Developer