Positive Photore​sists

For Greyscale Lithography

▷ Material Attributes

· Reduced contrast

· Film thickness up to 60 µm and higher

· 50-60 µm depth range of the patterns possible in greyscale lithography

· Spectral sensitivity 350…450 nm

· High intensity laser exposure possible without outgassing

· Suitable for electroplating

· Suitable for dry etch processes e.g. with CHF3, CF4, SF6

· Suitable for pattern reflow after standard binary lithography

▷ Material Uses

· Use of manufactured 3D patterns in micro-optics, MEMS and MOEMS, displays

· Pattern transfer by UV moulding

                        Etching

                        Electroplating

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※ Compatible Developer: ma-D 532/S, mr-D 526/S (TMAH​​ based) for greyscale lithography​