E-beam Processing

▷ Material Attributes​

· Positive tone

· E-beam and X-ray imageable

· Wide range of film thicknesses

· Broad range of molecular weights & dilutions​

· Excellent adhesion to most substrates

· Compatible with multi-layer processes​

▷ Material Uses​

· Wafer thinning

· Protective coatings

· PHEMT

· Multi-layer T-gate processes

· Other direct-write e-beam processes

▷ Product line

· 950K PMMA in chlorobenzene or anisole

​· 495K PMMA in chlorobenzene or anisole

​· Copolymer in ethyl lactate

※ Compatible Developer: MIBK, M/1 1:1, M/1 1:2, M/1 1:3