photo-curable NIL resist, solvent-free​​

▷​ Material Attributes​​

· Inkjet dispensing at room temperature due to low viscosity (15 mPas), e.g. for step-and-repeat NIL processes

· No prebake after substrate coating due to solvent-free resist formulation

· Very fast curing for high throughput R2R-NIL, web speed up to 30 m/min shown

· Good adhesion to PC and PET substrates

· Excellent dry etch stability for pattern transfer processes

· Residue-free removable with oxygen plasma

▷ Material Uses​

· ​Etch mask for pattern transfer processes (dry and wet etching)

· Application of  nanostructures on polymer foils

· Fabrication of nanostructures for Nano-optical devices, SOEs

                                        Organic electronics (OLED, OPV, OTFT)

                                        Microelectronics

                                        LEDs, photonic crystals