Silicon containing thermoplastic NIL resist​

▷​ Material Attributes​

​· High oxygen plasma resistance due to a Si content of 10 %

· Good stamp release characteristics give rise to a low defectivity rate

▷ Material Uses

· ​Fabrication of micro/nano-scale patterns with high aspect ratios >> 3

· Patterned sapphire substrates (PSS) for fabrication of high brightness LEDs

· Micro/nanopillars for nanofluidic devices, e.g. DNA electrophoresis

· Fabrication of photonic crystals