제품 기본설명
Si-containing thermal nanoimprint resist series for the fabrication of high aspect ratio patterns
제품 상세설명
▣ Excellent flowability characteristics render short imprint cycle times and enable a fast filling of even large patterns with microscale dimensions
▣ High oxygen plasma resistance due to a Si content of 10%
▣ Good mould release characteristics give rise to a low defectivity rate
관련제품
등록된 상품이 없습니다.