제품 상세설명
Positive Photoresists
For high resolution applications
▷ Material Attributes
· 100…500 nm film thickness
· Sensitive to 350…450 nm exposure
· Steep sidewalls due to high contrast enable high quality etched patterns
· Aqueous alkaline development
· Etch resistant
▷ Material Uses
· Laminary gratings
· VLS gratings
※ Compatible Developer: ma-D 374/S
관련제품
등록된 상품이 없습니다.