제품 상세설명
Positive Photoresists for Electrolytic Plating
▷ Material Attributes
· Positive tone, chemically amplified resist
· 10 to 40 µm film thickness in a single coat
· i-Line/broadband sensitivity, 3:1 achievable aspect ratio
· No rehydration or latency delay
· Aqueous alkaline development (standard 0.26N TMAH)
· Excellent chemical resistance and residue-free removal
관련제품
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